Thickness distribution of thin amorphous chalcogenide films prepared by pulsed laser deposition

Applied Physics A: Materials Science and Processing

Volumn 93, Issue 3, 2008, Pages 617-620

  Pavlišta, Martin ^a   Hrdlička, Martin ^a   Němec, Petr ^a   Přikryl, Jan ^a   Frumar, Miloslav ^a  

^a UNIVERSITY OF PARDUBICE   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; FILM PREPARATION; GAS LASERS; KRYPTON; LASERS; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; SEMICONDUCTING SELENIUM COMPOUNDS; SPECTROSCOPIC ELLIPSOMETRY; THICK FILMS; THICKNESS CONTROL; THIN FILMS;

AMORPHOUS CHALCOGENIDE FILMS; AMORPHOUS CHALCOGENIDES; ANGLE SPECTROSCOPIC ELLIPSOMETRIES; BULK GLASSES; EXPERIMENTAL DATUM; KRF EXCIMER LASERS; LASER BEAM SCANNING; PULSED LASERS; THICKNESS DISTRIBUTIONS; THICKNESS PROFILES;

AMORPHOUS FILMS;

EID: 54549088948     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-008-4687-8     Document Type: Article

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