Wavelength selection for the far-infrared p-Ge laser using etched silicon lamellar gratings

Optics and Laser Technology

Volumn 37, Issue 2, 2005, Pages 87-91

  Du Bosq, T W ^a   Peale, R E ^a   Nelson, E W ^a   Muravjov, A V ^a,c   Walters, D A ^a   Subramanian, G ^a   Sundaram, K B ^a   Fredricksen, C J ^b  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

^b Zaubertek Inc   (United States)

^c INSTITUTE FOR PHYSICS OF MICROSTRUCTURES   (Russian Federation)

Author keywords

Germanium; Laser; Terahertz

Indexed keywords

DIFFRACTION GRATINGS; ETCHING; GERMANIUM; GOLD; LASER OPTICS; MICROMACHINING; MIRRORS; QUANTUM THEORY; RESONANCE; SILICON WAFERS; VOLTAGE CONTROL;

LAMELLAR MIRRORS; QUANTUM CASCADE LASERS (QCL); TERAHERTZ;

INFRARED DEVICES;

EID: 5444255091     PISSN: 00303992     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optlastec.2004.02.011     Document Type: Article

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