Effect of thickness on the properties of vacuum deposited Cd 0.75Sn0.25Se mixed chalcogenide thin films

Materials Chemistry and Physics

Volumn 88, Issue 2-3, 2004, Pages 250-257

  Padiyan, D Pathinettam ^a   Marikani, A ^b   Murali, K R ^c  

^a MANONMANIAM SUNDARANAR UNIVERSITY   (India)

^b MEPCO SCHLENK ENGINEERING COLLEGE   (India)

^c CENTRAL ELECTROCHEMICAL RESEARCH INSTITUTE   (India)

Author keywords

Electrical properties; Optical properties; Semiconductor; Thin films; Vapour deposition

Indexed keywords

LATTICE CONSTANTS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTOR MATERIALS; SPECTROPHOTOMETERS; STOICHIOMETRY; THIN FILMS; VACUUM; VAPOR DEPOSITION;

DECAY PROCESSES; POWER LAW; RESIDUAL FACTOR; UNIT CELLS;

CADMIUM COMPOUNDS;

EID: 5444238514     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2003.09.050     Document Type: Article

References (37)

1. Boudrau R.A., Rauh R.D. Sol. Energy Mater. 7:1982;385.
2. Kainthla R.C., Pandya D.K., Chopra K.L. J. Electrochem. Soc. 127:1980;277.
3. Van Calster A., Vervaet A., De Rycke I., De Baets J., Vanfleteren J. J. Cryst. Growth. 86:1988;924.
4. Ren J., Bowers K.A., Sneed B., Dreifus D.L., Cook J.W. Jr., Schetzina J.F., Kolbus R.M. Appl. Phys. Lett. 57:1990;1901.
5. Roth M. Nucl. Instr. Meth. A. 283:1989;291.
6. Bletskan D.I., Kopinets I.F., Pogorsh P.P., Salkora E.N., Chepor D.V. Kristallografiya. 20:1978;1008.
7. Rao T.S., Ray B.K.S., Chaudhurai A.K. Thin Solid Films. 165:1988;257.
8. Baxter C.R., McLennan W.D. J. Vac. Sci. Technol. 12:1975;110.
9. Rodot M. Acta Electron. 18:1975;345.
10. Eriksson S., Gruszecki T., Carlsson P., Holmström B. Thin Solid Films. 269:1995;14.
11. Terada T. J. Phys. D. 4:1971;1991.
12. Burger A., Roth M. J. Cryst. Growth. 67:1984;507.
13. Agnihotri O.P., Jain A.K., Gupta B.K. J. Cryst. Growth. 46:1979;491.
14. D.R. Lide, H.P.R. Frederikse (Eds.), CRC Handbook of Chemistry and Physics, CRC Press, USA, 1994, pp. 12-95.
15. Bhatt V.P., Gireesan K., Desai C.F. Cryst. Res. Technol. 24:1989;187.
16. A. Goswami, Thin Film Fundamentals, New Age International (P) Ltd., New Delhi, 1996.
17. Louër D., Louër M. J. Appl. Cryst. 5:1972;271.
18. Boultif A., Louër D. J. Appl. Cryst. 24:1991;987.
19. Holland T.J.B., Redfern S.A.T. Mineral. Mag. 61:1997;65.
20. Pathinettam Padiyan D., Marikani A. Cryst. Res. Technol. 37:2002;1241.
21. Chan D.S.H., Hill A.E. Thin Solid Films. 38:1976;163.
22. K.G. Gunther, in: J.C. Anderson (Ed.), The Use of Thin Films in Physical Investigations, Academic Press, London, 1966.
23. C.D. Wagner, W.M. Riggs, L.E. Davis, T.F. Moulder, G.E. Muilenberg, Handbook of X-ray Photoelectron Spectroscopy, Perkin-Elmer, Norwalk, CT, 1978, p. 182.
24. Selvam P., Viswanathan B., Srinivasan V. J. Less Common Met. 161:1990;1.
25. John K.J., Pradeep B., Mathai E. J. Mater. Sci. 29:1994;1581.
26. R.A. Smith, Semicondutors, 1st ed., Cambridge University Press, Cambridge, 1959.
27. Shaalan M.S., Müller R. Solar Cells. 28:1990;185.
28. Pal U., Samanta D., Ghorai S., Chaudhuri A.K. J. Appl. Phys. 74(10):1993;6368.
29. Chan D.S.H., Hill A.E. Thin Solid Films. 38:1976;163.
30. H.M. Rosenberg, The Solid State, 3rd ed., Oxford University Press, Oxford, 1989, p. 285.
31. A. Rose, Concepts in Photoconductivity and Allied Problems, Wiley-Interscience, New York, 1963, p. 34.
32. Devi S., Prakash S.G. Pramana-J. Phys. 39:1992;145.
33. Fuhs W., Meyer D. Phys. Status Sol. (a). 24:1974;275.
34. Staebler D.L., Wronski C.R. Appl. Phys. Lett. 31:1977;292.
35. Yoon J.H., Kim M.S., Lee Ch. J. Non-Cryst. Solids. 114:1989;636.
36. Nair M.T.S., Nair P.K., Zingaro R.A., Meyers E.A. J. Appl. Phys. 74:1993;1879.
37. Pillai P.K.C., Nath R., Nair P.K. Ind. J. Pure Appl. Phys. 16:1978;698.