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Volumn 39, Issue 10, 2004, Pages 1615-1621

InP HBT integrated circuit technology with selectively implanted subcollector and regrown device layers

Author keywords

HBT; InP; Ion implantation; Molecular beam epitaxy (MBE)

Indexed keywords

CURRENT DENSITY; DOPING (ADDITIVES); GAIN CONTROL; HETEROJUNCTION BIPOLAR TRANSISTORS; INDUCTIVELY COUPLED PLASMA; ION IMPLANTATION; MOLECULAR BEAM EPITAXY;

EID: 5444230242     PISSN: 00189200     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSSC.2004.833560     Document Type: Conference Paper
Times cited : (14)

References (9)
  • 7
    • 0035395944 scopus 로고    scopus 로고
    • Demonstration of sub-5 ps CML ring oscillator gate delay with reduced parasitic AlInAs/InGaAs HBT
    • July
    • M. Sokolich, A. R. Kramer, Y. K. Boegeman, and R. R. Martinez, "Demonstration of sub-5 ps CML ring oscillator gate delay with reduced parasitic AlInAs/InGaAs HBT," IEEE Electron Device Lett., vol. 22, pp. 309-311, July 2001.
    • (2001) IEEE Electron Device Lett. , vol.22 , pp. 309-311
    • Sokolich, M.1    Kramer, A.R.2    Boegeman, Y.K.3    Martinez, R.R.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.