Physical vapor deposition of [EMIM][Tf2N]: A new approach to the modification of surface properties with ultrathin ionic liquid films

ChemPhysChem

Volumn 9, Issue 15, 2008, Pages 2185-2190

  Cremer, Till ^a   Killian, Manuela ^a   Gottfried, J Michael ^a   Paape, Natalia ^a   Wasserscheid, Peter ^a   Maier, Florian ^a   Steinrück, Hans Peter ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Ionic liquids; Physical vapor deposition; Surface chemistry; Thin films; X ray photoelectron spectroscopy

Indexed keywords

IONIC LIQUIDS; LIQUID FILMS; PHOTOELECTRONS; PHOTONS; PHYSICAL VAPOR DEPOSITION; SUBSTRATES; SURFACE CHEMISTRY; THERMAL EVAPORATION; THIN FILMS; VACUUM EVAPORATION; X RAY PHOTOELECTRON SPECTROSCOPY;

AMBIENT CONDITIONS; BI-LAYER; GLASS SUBSTRATES; MOLECULAR LAYER; NEW APPROACHES; THREE-DIMENSIONAL GROWTH; ULTRA-THIN; ULTRAHIGH VACUUM CONDITIONS;

ULTRATHIN FILMS;

EID: 54349100496     PISSN: 14394235     EISSN: 14397641     Source Type: Journal    
DOI: 10.1002/cphc.200800300     Document Type: Article

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