Ferroelectric liquid crystal aligned on SiO2 thin films using ion-beam deposition

Journal of the Society for Information Display

Volumn 15, Issue 10, 2007, Pages 853-857

  Li, Xihua ^a   Murauski, Anatoli ^a   Chigrinov, Vladimir G ^a   Khokhlov, A ^b   Khokhlov, E ^b  

^a HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

^b Izovac Ltd   (Belarus)

Author keywords

Ferroelectric liquid crystal; Ion beam deposition; SiO2 alignment layer

Indexed keywords

ALIGNMENT; CHEMICAL MODIFICATION; DEPOSITION; FERROELECTRICITY; ION BEAMS; LIGHT SOURCES; LIQUID CRYSTALS; POWDERS; SILICON COMPOUNDS; SPUTTER DEPOSITION; THICK FILMS;

ALIGNMENT LAYERS; BEAM DEPOSITIONS; DEPOSITION ANGLES; ELECTRICAL TREATMENTS; FERROELECTRIC LIQUID CRYSTAL; FERROELECTRIC LIQUID CRYSTALS; FILM SURFACES; LINEAR DESIGNS; SIO2 ALIGNMENT LAYER; SPUTTERING DEPOSITIONS; THIN-FILMS; TWO TYPES;

IONS;

EID: 54149094098     PISSN: 10710922     EISSN: None     Source Type: Journal    
DOI: 10.1889/1.2798826     Document Type: Article

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