Photon irradiation-induced structural and interfacial phenomena in pure and alio-valently doped zirconia thin films

Philosophical Magazine

Volumn 88, Issue 17, 2008, Pages 2519-2528

  Tsuchiya, M ^a   Ramanathan, S ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

Oxygen vacancies; UV photon thin film synthesis; Zirconia

Indexed keywords

ANNEALING; CRYSTAL ATOMIC STRUCTURE; ELECTROMAGNETIC WAVES; GERMANIUM; IRRADIATION; NANOSTRUCTURED MATERIALS; OXYGEN; OXYGEN VACANCIES; PHOTONS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; THICK FILMS; THIN FILM DEVICES; THIN FILMS; YTTRIUM ALLOYS;

DOPED ZIRCONIAS; DOPING; INTERFACIAL LAYERS; INTERFACIAL PHENOMENON; INTERFACIAL PROPERTIES; LENGTH SCALES; PHOTON IRRADIATIONS; PHYSICAL VAPOUR DEPOSITIONS; SHARP INTERFACES; STRUCTURAL CHANGES; SUBSTRATE OXIDATIONS; ULTRA-VIOLET; UV PHOTON THIN FILM SYNTHESIS; UV PHOTONS; UV-IRRADIATION; ZIRCONIA LAYERS;

ZIRCONIA;

EID: 54049145907     PISSN: 14786435     EISSN: 14786443     Source Type: Journal    
DOI: 10.1080/14786430802247189     Document Type: Article

References (29)

1. A.H. Heuer and L.W. Hobbs (eds.), Advances in Ceramics, Vol. 3, American Ceramic Society, Columbus, OH, 1981.
2. G.D. Wilk, R.M. Wallace and J.M. Anthony, J. Appl. Phys. 89 (2001) p.5243.
3. S. Ramanathan, P.C. McIntyre, S. Guha et al., Appl. Phys. Lett. 84 (2004) p.389.
4. H. Huang, M. Nakamura, P.C. Su et al., J. Electrochem. Soc. 154 (2007) p.B20.
5. J. Fleig, H.L. Tuller and J. Maier, Solid State Ionics 174 (2004) p.261.
6. H.G. Scott, J. Mater. Sci. 10 (1975) p. 1527.
7. E.C. Subbarao and H.S. Matt, Solid State Ionics 11 (1984) p.317.
8. N. Wakiya, M. Yoshida, T. Kiguchi et al., Thin Solid Films 411 (2002) p.268.
9. M. Tsuchiya, A.M. Minor and S. Ramanathan, Phil. Mag. 87 (2007) p.5673.
10. C.L. Chang and S. Ramanathan, J. Electrochem. Soc. 154 (2007) p.G160.
11. S. Ramanathan, G.D. Wilk, D.A. Muller et al., Appl. Phys. Lett. 79 (2001) p.2621.
12. S. Ramanathan, D.A. Müller, G.D. Wilk et al., Appl. Phys. Lett. 79 (2001) p.3311.
13. M. Tsuchiya and S. Ramanathan, Appl. Phys. Lett. 92 (2008) p.033107.
14. N. Asakuma, H. Hirashima, H. Imai et al., J. Appl. Phys. 92 (2002) p.5707.
15. H. Imai, A. Tominaga, H. Hirashima et al., J. Appl. Phys. 85 (1999) p.203.
16. K. Nishizawa, T. Miki, K. Suzuki et al., J. Mater. Res. 18 (2003) p.899.
17. K. Nishizawa, T. Miki, K. Suzuki et al., J. Mater. Res. 20 (2005) p.3133.
18. Y. Zhao, K. Kita, K. Kyuno et al., Jpn. J. Appl. Phys. 46 (2007) p.4189.
19. M. Tsuchiya and S. Ramanathan, Appl. Phys. Lett. 91 (2007) p.253104.
20. A. Kazor and I.W. Boyd, J. Appl. Phys. 75 (1994) p.227.
21. N. Wakiya, N. Tajiri, T. Kiguchi et al., Jpn. J. Appl. Phys. 45 (2006) p.8827.
22. M. Birkholz, Thin Film Analysis by X-ray Scattering, Wiley-VCH, Weinheim, 2006.
23. S. Ramanathan, D. Chi, P.C. Mclntyre et al., J. Electrochem. Soc. 150 (2003) p.F110.
24. M. W. Barsoum, Fundamentals of Ceramics, McGraw-Hill, New York, 1997.
25. V.B. Glushkova and M.V. Kravchinskaya, Ceram. Int. 11 (1965) p.56.
26. S. Ramanathan, P.C. McIntyre, J. Luning et al., Phil. Mag. Lett. 82 (2002) p.519.
27. Y. Kamata, Mater. Today 11 (2008) p.30.
28. Y. Kamata, Y. Kamimuta, T. Ino et al., Jpn. J. Appl. Phys. 44 (2005) p.2323.
29. M. Kilo, C. Argirusis, G. Borchardt et al., Phys. Chem. Chem. Phys. 5 (2003) p.2219.