Photochemical oxidation of As(III) by vacuum-UV lamp irradiation

Water Research

Volumn 42, Issue 13, 2008, Pages 3455-3463

  Yoon, Sung Hwan ^a   Lee, Jai H ^a   Oh, Sangeun ^b   Yang, Jae E ^b  

^a Gwangju Institute of Science and Technology (GIST)   (South Korea)

^b Kangwon National University   (South Korea)

Author keywords

Activated alumina (AA); As(III); As(V); FeCl3; OH radicals; Vacuum UV (VUV) lamp irradiation

Indexed keywords

ACTIVATED ALUMINA; ALUMINUM OXIDE; ASCORBIC ACID; BATCH REACTORS; CHLORINE COMPOUNDS; EFFICIENCY; FREE RADICALS; IRRADIATION; OXIDANTS; OXIDATION; RADIATION;

AS OXIDATION(III); EFFECTIVE REMOVALS; EXPERIMENTAL CONDITIONS; FECL3; OH RADICAL; OXIDATION EFFICIENCY; PHOTOCHEMICAL OXIDATION; VACUUM-UV LAMP IRRADIATIONS;

IRON COMPOUNDS;

ADSORBENT; ALUMINUM OXIDE; ARSENIC DERIVATIVE; FERRIC CHLORIDE; FERRIC ION; HUMIC ACID; HYDROGEN PEROXIDE; OXIDIZING AGENT; RADICAL; SILICON DIOXIDE; TITANIUM DIOXIDE; WATER;

ALUMINUM OXIDE; ARSENIC; COAGULATION; HYDROXYL RADICAL; IRRADIATION; PERFORMANCE ASSESSMENT; PHOTOCHEMISTRY; PHOTOOXIDATION; ULTRAVIOLET RADIATION;

ALKALINITY; ARTICLE; BATCH REACTOR; CATALYST; COMPARATIVE STUDY; ENVIRONMENT; EXPERIMENT; LABORATORY; LIGHT; PHOTOOXIDATION; PRECIPITATION; PRIORITY JOURNAL; ULTRAVIOLET A RADIATION; ULTRAVIOLET C RADIATION; ULTRAVIOLET IRRADIATION; VACUUM;

EID: 54049143279     PISSN: 00431354     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.watres.2008.04.018     Document Type: Article

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