Annealing effect on the microstructure modification and tribological properties of amorphous carbon nitride films

Journal of Applied Physics

Volumn 104, Issue 7, 2008, Pages

  Wang, Zhou ^a,b   Wang, Chengbing ^a,b   Wang, Qi ^a,b   Zhang, Junyan ^a  

^a LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON; ANNEALING; CARBON; CARBON FILMS; CARBON NITRIDE; CYANIDES; FILM GROWTH; FILMS; FOURIER TRANSFORMS; FRICTION; GRAPHITE; GRAPHITIZATION; INFRARED SPECTROSCOPY; MATERIALS PROPERTIES; MICROSTRUCTURE; NITRIDES; PHOTOELECTRON SPECTROSCOPY; RAMAN SPECTROSCOPY; SPECTRUM ANALYSIS; TRIBOLOGY; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS CARBON NITRIDE FILMS; ANNEALING EFFECTS; ANNEALING TEMPERATURES; BULK MODIFICATIONS; CARBON NITRIDE FILMS; CHEMICAL STATES; COEFFICIENT OF FRICTIONS; COUNTERFACE MATERIALS; FOURIER TRANSFORM INFRARED SPECTROMETERS; FRICTION COEFFICIENTS; GRAPHITIC FILMS; GRAPHITIZATION PROCESSES; HIGH-TEMPERATURE; MICROSTRUCTURAL; MICROSTRUCTURE MODIFICATIONS; RAMAN SIGNALS; SURFACE CONTAMINATIONS; THERMAL ANNEALING; TRANSFER FILMS; TRIBOLOGICAL PROPERTIES; VOLATILE SPECIES; X-RAY PHOTOELECTRON SPECTROSCOPIES;

AMORPHOUS FILMS;

EID: 54049129270     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2978222     Document Type: Article

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