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Volumn 104, Issue 7, 2008, Pages

Phase change nanodots patterning using a self-assembled polymer lithography and crystallization analysis

(11) Zhang, Yuan a Raoux, Simone b Krebs, Daniel b Krupp, Leslie E b Topuria, Teya b Caldwell, Marissa A a Milliron, Delia J b Kellock, Andrew b Rice, Philip M b Jordan Sweet, Jean L c Wong, H S Philip a

a Stanford University (United States)

b IBM ALMADEN RESEARCH CENTER (United States)

c IBM T J WATSON RESEARCH CENTER (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABS RESINS; CRYSTALLIZATION; LITHOGRAPHY; NANOCRYSTALLINE ALLOYS; NANOSTRUCTURED MATERIALS; PHASE TRANSITIONS; POLYMERS; POLYSTYRENES; SILVER; TELLURIUM COMPOUNDS; THICK FILMS;

BLANKET THIN FILMS; CRYSTALLIZATION BEHAVIORS; CRYSTALLIZATION TEMPERATURES; DIBLOCK COPOLYMER TEMPLATES; DIFFERENT SUBSTRATES; FLEXIBLE; HIGH DENSITIES; NANODOT ARRAYS; NANODOTS; NANOSCALE STRUCTURES; PATTERNED MATERIALS; PATTERNING; PHASE CHANGES; PHASE-TRANSITION; SMALL SCALES; TEMPERATURE RANGES; TIME-RESOLVED; TRANSITION TEMPERATURES; X-RAY DIFFRACTIONS;

PHASE CHANGE MATERIALS;

EID: 54049115482 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.2981070 Document Type: Article

Times cited : (29)

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