Modeling of nitrogen/diborane/methane/hydrogen plasma for nanocrystalline diamond growth: Comparison with experimental data

Diamond and Related Materials

Volumn 17, Issue 12, 2008, Pages 2067-2070

  Liang, Qi ^a   Harrison, Joseph G ^a   Vohra, Yogesh K ^a  

^a UNIVERSITY OF ALABAMA AT BIRMINGHAM   (United States)

Author keywords

Boron doping; CHEMKIN; Microwave Plasma assisted CVD (MPCVD); Modeling; Nanocrystalline diamond

Indexed keywords

BORON; BORON COMPOUNDS; DIAMONDS; ELECTROMAGNETIC WAVES; GAS DYNAMICS; GASES; MICROWAVES; NANOCRYSTALLINE ALLOYS; NANOCRYSTALLINE MATERIALS; NANOSTRUCTURED MATERIALS; NONMETALS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SURFACE ROUGHNESS;

BORON ATOMS; BORON CONTENTS; CHEMICAL INTERACTIONS; CHEMKIN; DIAMOND LATTICES; DIAMOND STRUCTURES; EQUILIBRIUM COMPOSITIONS; EXPERIMENTAL DATUM; GAS PHASES; INCORPORATION MECHANISMS; MICROSTRUCTURE VARIATIONS; MICROWAVE PLASMA-ASSISTED CVD (MPCVD); MICROWAVE PLASMAS; MODELING; MOLECULAR FRACTIONS; NANOCRYSTALLINE DIAMOND; NANOCRYSTALLINE DIAMONDS; NANOCRYSTALLINITY; NITROGEN ADDITIONS; THERMODYNAMIC EQUILIBRIUMS;

DIAMOND FILMS;

EID: 54049105639     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2008.07.001     Document Type: Article

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