Characterizing the distribution of nonylphenol ethoxylate surfactants in water-based pressure-sensitive adhesive films using atomic-force and confocal Raman microscopy

Journal of Physical Chemistry B

Volumn 112, Issue 38, 2008, Pages 11907-11914

  Xu, Guizhen H ^a   Dong, Jinping ^a   Zhang, Jiguang ^a   Severtson, Steven J ^a   Houtman, Carl J ^b   Gwin, Larry E ^c  

^a UNIVERSITY OF MINNESOTA   (United States)

^b FOREST PRODUCTS LABORATORY   (United States)

^c Franklin International   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABS RESINS; ACIDS; ADHESIVES; ANIONIC SURFACTANTS; ATOMIC FORCE MICROSCOPY; ATOMIC PHYSICS; ATOMS; BIOPHYSICS; CONCENTRATION (PROCESS); DEPTH PROFILING; ETHANOL; IMAGE SEGMENTATION; LATEXES; MICROSCOPIC EXAMINATION; NONIONIC SURFACTANTS; OFFSHORE OIL WELL PRODUCTION; PEELING; PHENOLS; SURFACE ACTIVE AGENTS;

ADHESIVE FILMS; AFM IMAGING; AIR INTERFACE; ATOMIC FORCE; BUTYL ACRYLATE; CONFOCAL RAMAN MICROSCOPY; CONVECTIVE FLOWS; DECAY CONSTANTS; ETHYLENEOXY; EXPONENTIAL DECAYS; FILM FORMATIONS; FILM INTERFACES; FILM SURFACES; IN CONCENTRATION; METHACRYLIC ACID; NON-IONIC; NONYLPHENOL ETHOXYLATE; PARTICLE COALESCENCE; PRESSURE-SENSITIVE ADHESIVE; SULFOSUCCINATE; SURFACTANT CONCENTRATIONS; SURFACTANT CONTENTS; VINYL ACETATE; WATER SOLUBILITIES; WATER-BASED; WATER-BASED ACRYLICS;

PHASE INTERFACES;

EID: 53849103626     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp804876x     Document Type: Article

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