Field emission from pure and nitrogen-incorporated diamond-like-carbon films

Journal De Physique. IV : JP

Volumn 6, Issue 5, 1996, Pages

  Lee, S ^c   Chung, B ^c   Ko, T Y ^c   Cho, H ^c   Jeon, D ^c   Lee, K R ^a   Yun, C E ^b  

^a Korea Institute of Science and Technology   (South Korea)

^b KT Cooperation   (South Korea)

^c Myong Ji University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; ELECTRIC ARCS; ELECTRIC CURRENTS; ELECTRON EMISSION; ELECTRONS; FILM GROWTH; FILMS; NITROGEN; SILICON CARBIDE; SUBSTRATES; SURFACES;

DIAMOND LIKE CARBON FILMS; EMISSION CURRENT; RADIO FREQUENCY PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION; SILICON SUBSTRATE;

FIELD EMISSION CATHODES;

EID: 5344227648     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (6)

1. Geis M. W., Efremow N. N., Woodhouse J. D., McAleese M. D., Marchywka M., Socker D. G., and Hochedez J. F., IEEE Elec. Dev. Lett. 12 (1991) 456-459.
2. Xu N. S., Tzeng Y., and Latham R. V., J. Phys. D 26 (1993) 1776-1780.
3. Kumar N., Xie C., Potter N., Krishnan A., Hilbert C., Eichman D., Schlam E., Schmidt H., and Wagal S., Tech. Dig. SID (1993) p43.
4. Lee S., Lee K. R., and D. Jeon, to be published.
5. Li L., Hasegawa Y., Tsong I. S. T., and Sakurai T., in this conference.
6. Hu C.-W., Kasuya A., Suto S., Wawro A., and Nishina Y., to be published.