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Volumn , Issue , 1992, Pages 14-17
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Ingaas/inp double channel HEMT on InP
a a a a
a
NTT CORPORATION
(Japan)
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRIC FIELDS;
GALLIUM ALLOYS;
GALLIUM COMPOUNDS;
HIGH ELECTRON MOBILITY TRANSISTORS;
III-V SEMICONDUCTORS;
INDIUM ALLOYS;
INTEGRATED OPTOELECTRONICS;
PIXELS;
SEMICONDUCTING INDIUM;
SEMICONDUCTING INDIUM GALLIUM ARSENIDE;
SEMICONDUCTING INDIUM PHOSPHIDE;
SEMICONDUCTOR ALLOYS;
CHANNEL STRUCTURES;
DC AND RF CHARACTERISTICS;
DOUBLE CHANNEL;
DRIFT VELOCITIES;
EFFECTIVE ELECTRONS;
HIGH ELECTRIC FIELDS;
HIGH ELECTRON MOBILITY;
INGAAS/INP;
INDIUM PHOSPHIDE;
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EID: 5344221080
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/ICIPRM.1992.235699 Document Type: Conference Paper |
Times cited : (24)
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References (10)
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