Laser-assisted poling of binary chromophore material

Journal of Physical Chemistry C

Volumn 112, Issue 21, 2008, Pages 7983-7988

  Olbricht, Benjamin C ^a   Sullivan, Philip A ^a   Wen, Gui An ^a   Mistry, Alok A ^a   Davies, Joshua A ^a   Ewy, Todd R ^a   Eichinger, Bruce E ^a   Robinson, Bruce H ^a   Reid, Philip J ^a   Dalton, Larry R ^a  

^a UNIVERSITY OF WASHINGTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATTENUATED TOTAL REFLECTION; ELECTRIC FIELD POLING; ELECTRIC-POLING FIELD; ELECTRO-OPTIC; ELECTRO-OPTIC ACTIVITY; ELECTRO-OPTIC COEFFICIENTS; ELECTRO-OPTIC PROPERTIES; IDEAL MODEL; IMPROVED STABILITY; IN SITU REFLECTION; INTER-MOLECULAR INTERACTIONS; INTERMOLECULAR ELECTROSTATIC INTERACTIONS; NON-CENTROSYMMETRIC; OPTICAL POWERS; OPTICAL-; PHOTOADDRESSABLE; PHOTONIC; POLARIZED LASERS; POLARIZED LIGHT; PROCESSING TEMPERATURES; REAL-TIME MONITORING; SECOND-ORDER NONLINEAR OPTICAL;

DIGITAL SIGNAL PROCESSING; ELECTRIC FIELDS; ELECTROMAGNETIC WAVES; ELECTRON BEAM LITHOGRAPHY; ELECTRONIC PROPERTIES; ELECTROOPTICAL DEVICES; ELECTROSTATICS; FLOW INTERACTIONS; LASERS; LIGHT REFLECTION; MATERIALS PROPERTIES; REFLECTION; SYSTEM STABILITY;

CHROMOPHORES;

EID: 53349142136     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp712154g     Document Type: Article

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