Spatially resolved thermal probe measurement for the investigation of the energy influx in an rf-plasma

Vacuum

Volumn 83, Issue 4, 2008, Pages 768-772

  Wolter, Matthias ^a   Stahl, Marc ^a   Kersten, Holger ^a  

^a UNIVERSITY OF KIEL   (Germany)

Author keywords

Plasma diagnostic; rf plasma; Thermal probe

Indexed keywords

CLADDING (COATING); ELECTROCHEMICAL ELECTRODES; ELECTROLYSIS; ELECTRON EMISSION; METALLIZING; NUCLEAR REACTORS; PLASMA DIAGNOSTICS; PLASMAS; SECONDARY EMISSION;

ENERGY INFLUX; PLASMA DIAGNOSTIC; PLASMA PROCESSING; PROCESS PLASMA; RADIO FREQUENCIES; REACTOR VESSELS; RF PLASMAS; RF-PLASMA; SECONDARY ELECTRON EMISSIONS; SPATIAL DISTRIBUTIONS; SPATIALLY RESOLVED; SUBSTRATE TEMPERATURE; THERMAL PROBE; THERMAL PROBES; TOTAL ENERGIES;

SUBSTRATES;

EID: 52949148557     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.05.017     Document Type: Article

References (25)

1. Thorton J. J Vac Sci Technol 11 4 (1974) 666
2. Hussla B., Enke K., Grunwald H., Lorenz G., and Stoll H. J Appl Phys D 20 (1987) 889
3. Deutsch H., Kersten H., and Rutscher A. Contrib Plasma Phys 29 (1989) 263
4. Deutsch H., Kersten H., Klagge S., and Rutscher A. Contrib Plasma Phys 28 (1988) 149
5. Zubimendi J., Vela M., Salvarezza R., Vazquezub C., Vara J., and Ariva A.J. Phys Rev E 50 2 (1994) 1367
6. Bernstein S., Wong T., and Tustison R. J Vac Sci Technol B 12 2 (1994) 605
7. Kugler S., Shimakawa K., Watanabe T., Hayashi K., Laszlo I., and Bellissent R. J Non-Cryst Solids 1143 (1993) 164
8. Bang K., Ghajar A., and Komanduri R. Thin Solid Films 238 (1994) 172
9. Savaloni H., Player M.A., Gu E., and Marr G. Rev Sci Instrum 1497 1 (1992) 63
10. Brune K., Röder H., Bromann H., and Kern K. Thin Solid Films 264 (1995) 230
11. Windischmann H. J Appl Phys 62 5 (1987) 1800
12. Rossnagel S. Thin Solid Films 171 (1989) 125
13. Mueller K. J Appl Phys A 40 (1986) 209
14. Nimmagadda R., and Bunshah R. J Vac Sci Technol 8 6 (1971) 677
15. Chow R., and Bunshah R. J Vac Sci Technol 8 6 (1971) 665
16. Thornton J. Thin Solid Films 54 (1978) 23
17. Wendt K., Ellmer R., and Wiesamann K. J Appl Phys 82 5 (1997) 2115
18. Steffen H., Kersten H., and Wulff H. J Vac Sci Technol A 12 (1994) 2780
19. Kersten H., Steffen H., Vender D., and Wagner H.E. Vacuum 46 (1995) 305
20. Thieme G., Basner R., Wiese R., and Kersten H. Faraday Discuss 137 (2007) 157
21. Morfill G.E., Thomas H.M., Konopka U., Rothermel H., Zuzic M., Ivlev A., et al. Phys Rev Lett 83 (1999) 1598-1601
22. Goree J. Plasma Sour Sci Technol 3 (1994) 400
23. Kersten H., Deutsch H., Steffen H., Kroesen G.M., and Hippler R. Vacuum 63 (2001) 385
24. Wolter M., and Melzer A. Phys Rev E E71 (2005) 036414
25. Kersten H., Stoffels E., Stoffels W., Otte M., Csambal C., Deutsch H., et al. J Appl Phys 87 (2000) 3637