Effect of deposition conditions on the response and durability of an Mg4Ni film switchable mirror

Vacuum

Volumn 83, Issue 3, 2008, Pages 486-489

  Bao, Shanhu ^a   Yamada, Yasusei ^a   Tajima, Kazuki ^a   Okada, Masahisa ^a   Yoshimura, Kazuki ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Electrochromic switching; Gasochromic switching; Magnetron sputtering; Metallic hydride; Mg Ni alloy thin film; Switchable mirror

Indexed keywords

MIRRORS; NICKEL; THICK FILMS;

DEPOSITION CONDITIONS; ELECTROCHROMIC SWITCHING; GASOCHROMIC SWITCHING; MAGNETRON SPUTTERING; METALLIC HYDRIDE; MG-NI ALLOY THIN FILM; SWITCHABLE MIRROR; SWITCHABLE MIRRORS; THIN FILMS; TRANSPARENT STATES;

MAGNESIUM PRINTING PLATES;

EID: 52949136630     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.04.013     Document Type: Article

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