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Volumn 83, Issue 4, 2008, Pages 712-714
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Optimised plasma enhanced chemical vapour deposition (PECVD) process for double layer diamond-like carbon (DLC) deposition on germanium substrates
a
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Author keywords
DLC Films; Hardness; IR; PECVD; Plasma process; Refractive index; Simulation; Wear
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Indexed keywords
DIAMONDS;
ELECTRIC FIELDS;
ELECTRIC LOAD MANAGEMENT;
ELECTROMAGNETIC FIELD THEORY;
ELECTROMAGNETIC FIELDS;
GERMANIUM;
HARDNESS;
IMAGING TECHNIQUES;
INFRARED SPECTROSCOPY;
LIGHT REFRACTION;
MOLECULAR BEAM EPITAXY;
OPTICAL PROPERTIES;
ORGANIC POLYMERS;
PLASMA DEPOSITION;
PLASMA DIAGNOSTICS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
PLASMAS;
REFRACTIVE INDEX;
REFRACTOMETERS;
SEMICONDUCTING GERMANIUM COMPOUNDS;
SPECTROSCOPIC ANALYSIS;
VICKERS HARDNESS;
ADHESIVE LAYERS;
BIAS-VOLTAGE;
CHEMICAL VAPOUR DEPOSITION;
DIAMOND-LIKE CARBON;
DLC-FILMS;
DOUBLE LAYER;
ELASTIC PROPERTIES;
ELECTRIC FIELD DISTRIBUTIONS;
ELECTRON MICROSCOPY.;
GERMANIUM SUBSTRATES;
GRADED INTERFACES;
IR;
LAYER THICKNESSES;
OPTICAL LAYERS;
PARALLEL PLATES;
PECVD;
PLASMA CHAMBER;
PLASMA-PROCESS;
PROTECTIVE LAYERS;
REACTANT GASSES;
RF PLASMAS;
SIMULATION;
SUBSTRATE TEMPERATURE;
WEAR;
WEAR-RESISTANT;
WORKING PRESSURES;
SUBSTRATES;
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EID: 52949135899
PISSN: 0042207X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.vacuum.2008.05.015 Document Type: Article |
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Times cited : (14)
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References (6)
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