New hydrogen sensor based on sputtered Mg-Ni alloy thin film

Vacuum

Volumn 83, Issue 3, 2008, Pages 699-702

  Yoshimura, Kazuki ^a   Bao, Shanhu ^a   Uchiyama, Naoki ^b   Matsumoto, Hiroyuki ^b   Kanai, Tomomi ^b   Nakabayashi, Seigo ^b   Kanayama, Hiroshi ^c  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b Atsumitec CO   (Japan)

^c KYUSHU UNIVERSITY   (Japan)

Author keywords

Hydrogen sensor; Magnesium nickel alloy; Palladium; Sputtering; Switchable mirror

Indexed keywords

ALLOYS; CHEMICAL SENSORS; CLADDING (COATING); CONCENTRATION (PROCESS); LIGHT METALS; MAGNESIUM; MAGNESIUM ALLOYS; MAGNESIUM PRINTING PLATES; MAGNETRON SPUTTERING; NICKEL; NICKEL ALLOYS; NONMETALS; PALLADIUM; PROTECTIVE COATINGS; SENSORS; SPUTTER DEPOSITION; THICK FILMS; THIN FILM DEVICES; THIN FILMS; VAPOR DEPOSITION;

CHECK SHEETS; HYDROGEN CONCENTRATIONS; HYDROGEN FLOW; HYDROGEN SENSING PROPERTIES; HYDROGEN SENSOR; HYDROGEN SENSORS; MAGNESIUM-NICKEL ALLOY; RESISTANCE CHANGES; SENSING RANGES; SPUTTERING; SWITCHABLE MIRROR;

HYDROGEN;

EID: 52949134818     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.04.047     Document Type: Article

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