Surface chemistry study of Mn-doped germanium nanowires

Applied Surface Science

Volumn 254, Issue 24, 2008, Pages 8093-8097

  Grossi, V ^a   Parisse, P ^a   Passacantando, M ^a   Santucci, S ^a   Impellizzeri, G ^b   Irrera, A ^b   Ottaviano, L ^a  

^a UNIVERSITY OF L'AQUILA   (Italy)

^b UNIVERSITY OF CATANIA   (Italy)

Author keywords

Germanium; Ion implantation; Manganese; Nanowires; SEM; Vapour liquid solid growth mechanism; XPS; XRD

Indexed keywords

DEPOSITION; ENERGY DISPERSIVE X RAY ANALYSIS; EVAPORATION; GERMANIUM; ION IMPLANTATION; MANGANESE; NANOCATALYSTS; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SILICON OXIDES; SILICON WAFERS; SINGLE CRYSTALS; SURFACE CHEMISTRY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC CONCENTRATION; ENERGY DISPERSIVE X-RAY; EXPERIMENTAL EVIDENCE; SCANNING ELECTRON MICROSCOPY IMAGE; SILICON OXIDE SUBSTRATES; SINGLE-CRYSTAL GERMANIUM; VAPOUR-LIQUID-SOLID GROWTHS; X RAY PHOTOEMISSION SPECTROSCOPY;

NANOWIRES;

EID: 52949133739     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.03.024     Document Type: Article

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