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Chemical Vapor Deposition

Volumn 13, Issue 1, 2007, Pages 17-20

The preparation of diamond/tungsten-carbide composite films by microwave plasma-assisted CVD

(3) Samra, Hisham Abu a Hong, Ruijiang a Jiang, Xin a

a UNIVERSITY OF SIEGEN (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITE MATERIALS; DIAMOND FILMS; DIAMONDS; ELECTROMAGNETIC WAVES; FILM PREPARATION; FLOW RATE; MICROWAVES; PLASMAS; TUNGSTEN; TUNGSTEN CARBIDE; VICKERS HARDNESS TESTING; X RAY ANALYSIS;

ADHESION STRENGTHS; CARBIDE COMPOSITES; FILM MORPHOLOGIES; INDENTATION TESTS; INDENTER; MICROWAVE PLASMAS; NOVEL PROCESSES; SECTION IMAGES; SINGLE PROCESSES; SIZE RANGES; TUNGSTEN SUBSTRATES; X-RAY DIFFRACTIONS;

COMPOSITE FILMS;

EID: 52949132778 PISSN: 09481907 EISSN: 15213862 Source Type: Journal
DOI: 10.1002/cvde.200604225 Document Type: Article

Times cited : (12)

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