Ion conducting properties of hydrogen-containing Ta2O5 thin films prepared by reactive sputtering

Vacuum

Volumn 83, Issue 3, 2008, Pages 528-530

  Abe, Yoshio ^a   Itadani, Naruhiro ^a   Kawamura, Midori ^a   Sasaki, Katsutaka ^a   Itoh, Hidenobu ^a  

^a KITAMI INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Ionic conductivity; Proton conducting solid electrolyte thin film; Reactive sputtering; Tantalum oxide

Indexed keywords

HYDROGEN; NONMETALS;

ION CONDUCTING PROPERTIES; IONIC CONDUCTIVITY; PROTON-CONDUCTING SOLID ELECTROLYTE THIN FILM; REACTIVE SPUTTERING; TANTALUM OXIDE;

TANTALUM;

EID: 52949118088     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.04.018     Document Type: Article

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