Molecular structure of tris(cyclopropylsilyl)amine as determined by gas electron diffraction and quantum-chemical calculations

Journal of Molecular Structure

Volumn 889, Issue 1-3, 2008, Pages 316-327

  Vishnevskiy, Yuri V ^a   Abaev, Maxim A ^a   Ivanov, Arkadii A ^a   Vilkov, Lev V ^a   Dakkouri, Marwan ^b  

^a MOSCOW STATE UNIVERSITY   (Russian Federation)

^b UNIVERSITY OF ULM   (Germany)

Author keywords

Conformational analysis; Electron diffraction; Isovalency; Quantum mechanical calculations; Si+ Si+ electrostatic repulsion; Tris(allylsilyl)amine; Tris(cyclopropylsilyl)amine

Indexed keywords

AMINATION; AMINES; DIFFRACTION; ELECTRON DIFFRACTION; KETONES; MOLECULAR STRUCTURE; ORGANIC COMPOUNDS; PHOTORESISTS; QUANTUM CHEMISTRY; SILICON; SULFUR COMPOUNDS;

CONFORMATIONAL ANALYSIS; CYCLOPROPYL; DFT CALCULATIONS; GAS ELECTRON DIFFRACTION; GAS-PHASE ELECTRON-DIFFRACTION; ISOVALENCY; QUANTUM MECHANICAL CALCULATIONS; QUANTUM-CHEMICAL CALCULATIONS; TORSIONAL ANGLES; TRIS(ALLYLSILYL)AMINE; TRIS(CYCLOPROPYLSILYL)AMINE;

CONFORMATIONS;

EID: 52949088574     PISSN: 00222860     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.molstruc.2008.02.013     Document Type: Article

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