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Volumn , Issue 37, 2008, Pages 4495-4497

A self-propagating system for Ge incorporation into nanostructured silica

Author keywords

[No Author keywords available]

Indexed keywords

GERMANIUM; NANOMATERIAL; SILICON DIOXIDE;

EID: 52649093865     PISSN: 13597345     EISSN: None     Source Type: Journal    
DOI: 10.1039/b804955f     Document Type: Article
Times cited : (18)

References (16)
  • 2
    • 52649158413 scopus 로고    scopus 로고
    • A. Sigel, H. Sigel and R. K. O. Sigel, Wiley & Sons Ltd, Chichester UK, 255
    • A. K. Davis and M. Hildebrand, in Metal Ions in Life Sciences, ed., A. Sigel,,, H. Sigel, and, R. K. O. Sigel,, Wiley & Sons Ltd, Chichester UK, 2008, vol. 4, p. 255
    • (2008) Metal Ions in Life Sciences, Ed.
    • Davis, A.K.1    Hildebrand In, M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.