Small microwave ion source for an ion implanter

Review of Scientific Instruments

Volumn 67, Issue 3, 1996, Pages 1003-1005

  Song, Zhizhong ^a   Jiang, Dong ^a   yu, Jinxiang ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

ION IMPLANTATION; ION SOURCES; MAGNETIC FIELD CONFIGURATIONS; MICROWAVE RADIATION; MILLI AMP BEAM CURRENTS; NITROGEN IONS; OXYGEN IONS; POWER RANGE 100 1000 W

Indexed keywords

EID: 5244329490     PISSN: 00346748     EISSN: 10897623     Source Type: Journal    
DOI: 10.1063/1.1146797     Document Type: Conference Paper

References (4)

1. Y. Torii, M. Shimada, and I. Watanabe, Rev. Sci. Instrum. 61, 253 (1990).RSINAK
2. T. Taylor, Rev. Sci. Instrum. 63, 2507 (1992).RSINAK
3. Y. Torii, M. Shimada, and I. Watanabe, Rev. Sci. Instrum. 63, 2559 (1992).RSINAK
4. S. R. Walter, Rev. Sci. Instrum. 63, 2562 (1992).RSINAK