Dynamics of the hydrogen oxidation and silicon dissolution reactions in the formation of porous silicon

Langmuir

Volumn 12, Issue 12, 1996, Pages 2875-2877

  Soares, D M ^a   Teschke, O ^a   Dos Santos, M C ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5244286128     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la950692i     Document Type: Article

References (16)

1. Canham, L. T. Appl. Phys. Lett. 1990, 57, 1046.
2. Smith, R. L.; Collins, S. D. J. Appl. Phys. 1992, 71, R1.
3. Lehmann, V.; Gösele, U. Appl. Phys. Lett. 1991, 58, 856.
4. Beale, M. I. J.; Benjamin, I. D.; Uren, M. J.; Chew, N. G.; Cullis, A. G. Appl. Phys. Lett. 1985, 46, 86.
5. Smith, R. L.; Chuang, S. F.; Collins, S. D. J. Electron. Mater. 1988, 17, 533.
6. Teschke, O.; Santos, M. C.; Kleinke, M. U.; Soares, D. M.; Galvão, D. S. J. Appl. Phys. 1995, 78, 590.
7. Teschke, O.; Galembeck, F.; Goncalves, M. C.; Davanzo, C. U. Appl. Phys. Lett. 1994, 64, 26.
8. Trucks, G. W.; Raghavachari, K.; Higashi, G. S.; Chabal, Y. J. Phys. Rev. Lett. 1990, 65, 504.
9. Judge, J. S. J. Electrochem. Soc. 1971, 118, 1772.
10. Memming, R.; Schwandt, G. Surf. Sci. 1966, 4, 109.
11. Theunissen, M. J. J. J. Electrochem. Soc. 1972, 119, 351.
12. Chazalviel, J. N. Surf. Sci. 1979, 88, 204.
13. Gerischer, H. Electrochim. Acta 1990, 35, 1677.
14. Memming, R.; Schwandt, G. Surf. Sci. 1966, 5, 97.
15. Meissner, D.; Memming, R. Electrochim. Acta 1992, 37, 799.
16. Chazalviel, J. N. Electrochim. Acta 1992, 37, 865.