|
Volumn 71, Issue 2 II, 2000, Pages 899-901
|
Electron cyclotron resonance ion source for high currents of mono- and multicharged ion and general purpose unlimited lifetime application on implantation devices
|
Author keywords
[No Author keywords available]
|
Indexed keywords
|
EID: 5244252706
PISSN: 00346748
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1150326 Document Type: Article |
Times cited : (11)
|
References (9)
|