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Volumn 71, Issue 2 II, 2000, Pages 899-901

Electron cyclotron resonance ion source for high currents of mono- and multicharged ion and general purpose unlimited lifetime application on implantation devices

Author keywords

[No Author keywords available]

Indexed keywords


EID: 5244252706     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1150326     Document Type: Article
Times cited : (11)

References (9)
  • 2
    • 0042821903 scopus 로고
    • R. C. Pardo et al., Proceedings of the 3rd International Conference on Ion Sources, Berkeley, CA, 1989; Rev. Sci. Instrum. 61, 239 (1990).
    • (1990) Rev. Sci. Instrum. , vol.61 , pp. 239
  • 6
    • 5244301338 scopus 로고    scopus 로고
    • Proceedings of the 14th International Conference on Application of Accelerators Denton
    • USA, Nov. to be published
    • A. Schempp, Proceedings of the 14th International Conference on Application of Accelerators Denton, USA, Nov. 1996, Nuclear Instrum. Methods (to be published)
    • (1996) Nuclear Instrum. Methods
    • Schempp, A.1
  • 9
    • 84994007980 scopus 로고    scopus 로고
    • Z. Q. Xie, Proceedings of the 7th International Conference on Ion Sources, Taormina, Italy, 1997; Rev. Sci. Instrum. 69, 625 (1998).
    • (1998) Rev. Sci. Instrum. , vol.69 , pp. 625


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.