Calibration of etching uniformity for large aperture multilevel diffractive optical element by ion beam etching

Review of Scientific Instruments

Volumn 71, Issue 2 II, 2000, Pages 1009-1011

  Fu, Yongqi ^a   Bryan, Ngoi Kok Ann ^a   Shing, Ong Nan ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5244238879     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1150374     Document Type: Article

References (7)

1. Gao Hong et al., Principle of Ion Beam Etching (Mechanical Industry Press, Beijing, 1989).
2. Bi Jianhua et al., Micromanufact. Technol. 2, 2 (1996).
3. M. Zhihong et al., Semiconductor Photonics Technology 2(1), 61 (1996).
4. G. Yongkang, G. Lurong, and Z. Xiaochun, Arct Optic Sinica 12, 252 (1992).
5. M. W. Farn, Proc. SPIE 1211, 125 (1990).
6. S. Teanm, Opt. Eng. 2035, 2534 (1994).
7. Operation Manual of Oxford 600, edited by Plasma Technology (Oxford, 1994).