Integrated stack etching using a helicon plasma source

Semiconductor International

Volumn 19, Issue 8, 1996, Pages 193-200

  Gibson Jr , Gerald W ^a   Hemker, David J ^a  

^a Plasma and Materials Technologies   (United States)

Author keywords

Gate stacks; High density sources; Plasma etch

Indexed keywords

EID: 5244237222     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (2)

1. A.S. Bergendahl, D.V. Horak, P.E. Bakeman and D.J. Miller, "Cluster Tools, Part 2: 16 Mb DRAM Processing," Semiconductor International, Sept. 1990.
2. 2 Etches," Proceedings on High Selectivity Dry Etching & Damage Control.