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Volumn 20, Issue 19, 2008, Pages 1648-1650

5-W DBR tapered lasers emitting at 1060 nm with a narrow spectral linewidth and a nearly diffraction-limited beam quality

Author keywords

Distributed Bragg reflector (DBR) lasers; Near infrared lasers; Semiconductor lasers; Tapered lasers

Indexed keywords

BEAM QUALITY; BRAGG CELLS; CRYSTALLOGRAPHY; DIFFRACTION; LASERS; OPTICAL PROPERTIES; POWER QUALITY; WAVEGUIDES;

EID: 52149114731     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/LPT.2008.2002744     Document Type: Article
Times cited : (66)

References (11)
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    • High-power distributed Bragg reflector lasers operating at 1065 nm
    • M. Achtenhagen, N. V. Amarasinghe, and G. A. Evans, "High-power distributed Bragg reflector lasers operating at 1065 nm," Electron. Lett., vol. 43, pp. 755-757, 2007.
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  • 3
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    • O. Brox, J. Wiedmann, F. Scholz, F. Bugge, J. Fricke, A. Klehr, T. Laurent, P. Ressel, H. Wenzel, G. Erbert, and G. Tränkle, Integrated 1060 nm MOPA pump source for high-power green light emitters in display technology, in Proc. SPIE, 2008, 6909, pp. 69091G-69091G-8.
    • O. Brox, J. Wiedmann, F. Scholz, F. Bugge, J. Fricke, A. Klehr, T. Laurent, P. Ressel, H. Wenzel, G. Erbert, and G. Tränkle, "Integrated 1060 nm MOPA pump source for high-power green light emitters in display technology," in Proc. SPIE, 2008, vol. 6909, pp. 69091G-69091G-8.
  • 5
    • 2442476208 scopus 로고    scopus 로고
    • Compact hybrid master oscillator power amplifier with 3.1 W CW output power at wavelength around 1061 nm
    • May
    • S. Schwertfeger, A. Klehr, G. Erbert, and G. Tränkle, "Compact hybrid master oscillator power amplifier with 3.1 W CW output power at wavelength around 1061 nm," IEEE Photon. Technol. Lett., vol. 16, no. 5, pp. 1268-1270, May 2004.
    • (2004) IEEE Photon. Technol. Lett , vol.16 , Issue.5 , pp. 1268-1270
    • Schwertfeger, S.1    Klehr, A.2    Erbert, G.3    Tränkle, G.4
  • 9
    • 27144449607 scopus 로고    scopus 로고
    • 980 nm DBR lasers using higher order gratings defined by I-line lithography
    • J. Fricke, H. Wenzel, M. Matalla, A. Klehr, and G. Erbert, "980 nm DBR lasers using higher order gratings defined by I-line lithography," Semicond. Sci. Technol., vol. 20, pp. 1149-1152, 2005.
    • (2005) Semicond. Sci. Technol , vol.20 , pp. 1149-1152
    • Fricke, J.1    Wenzel, H.2    Matalla, M.3    Klehr, A.4    Erbert, G.5
  • 10
    • 18944377635 scopus 로고    scopus 로고
    • Novel passivation process for the mirror facets of high-power semiconductor diode lasers
    • May
    • P. Ressel, G. Erbert, U. Zenner, K. Häusler, G. Beister, and G. Tränkle, "Novel passivation process for the mirror facets of high-power semiconductor diode lasers," IEEE Photon. Technol. Lett. vol. 17, no. 5, pp. 962-964, May 2005.
    • (2005) IEEE Photon. Technol. Lett , vol.17 , Issue.5 , pp. 962-964
    • Ressel, P.1    Erbert, G.2    Zenner, U.3    Häusler, K.4    Beister, G.5    Tränkle, G.6
  • 11
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    • Optimization of SHG for high-brightness semiconductor laser diode radiation with large aberrations
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    • Proc. DGAO 2005
    • Güther, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.