A novel junction-free BE-SONOS NAND Flash

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 2008, Pages 140-141

  Lue, Hang Ting ^a   Lai, Erh Kun ^a   Hsiao, Y H ^a   Hong, S P ^a   Wu, M T ^a   Hsu, F H ^a   Lien, N Z ^a   Wang, S Y ^a   Yang, L W ^a   Yang, T ^a   Chen, K C ^a   Hsieh, K Y ^a   Liu, Rich ^a   Lu, Chih Yuan ^a  

^a MACRONIX INTERNATIONAL CO LTD   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

NANOTECHNOLOGY; SILICON; TECHNOLOGY;

FRINGE FIELDS; N -CHANNEL; NAND FLASH; NEW DEVICES; P-CHANNEL; SHORT-CHANNEL EFFECT; SIMULATION RESULTS; VLSI TECHNOLOGIES;

FIELD EFFECT TRANSISTORS;

EID: 51949099380     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/VLSIT.2008.4588594     Document Type: Conference Paper

References (3)

1. E. K. Lai et al, in IEDM Tech. Dig., 2006, pp. 41-44.
2. S. M. Jung, et al, IEDM Tech. Dig. 2006, pp.39-43
3. H. T. Lue, et. al, VLSI Tech. Digest, 2007, pp. 140-141