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Volumn 8, Issue 4, 2008, Pages 1100-1104

Electrical properties of self-assembled branched inas nanowire junctions

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BEAM EPITAXY; CRYSTAL GROWTH; ELECTRIC PROPERTIES; INDIUM ARSENIDE; INTEGRATED CIRCUIT LAYOUT; NANOELECTRONICS; NANOWIRES; SEMICONDUCTING INDIUM; SEMICONDUCTOR JUNCTIONS;

EID: 51849102279     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl073193y     Document Type: Article
Times cited : (56)

References (41)
  • 26
    • 33344478702 scopus 로고    scopus 로고
    • Note that it is not possible for us to extract the mean free path of carriers in the branched nanowires from our measurements pre-sented in this work. However, from an early magnetotransport measurement study, the mean free path of carriers in InAs nanowires grown in the same CBE setup was found to be 60-100 nm at 8 K when the nanowires became well conductive see: Hansen, A. E, Bjork, M. T, Fasth, C, Thelander, C, Samuelson, L. Phys. Rev. B 2005, 71, 205-328, This value of the mean free path is slightly smaller than, but on the same order of, the junction dimension l jcn in the devices studied in this work
    • jcn in the devices studied in this work.
  • 35
    • 0001391109 scopus 로고    scopus 로고
    • Here, it is interesting to note that, outside the flat plateau region of the curve measured at Vbg, 3.9 V, the plot for VP vs VR shows a well-defined down-bending behavior, indicating a transition to ballistic transport. We attribute this diffusive-to-ballistic transport transition to a bias induced scattering length enhancement effect. Outside the flat plateau region, the bias voltage applied between the left and right electrodes is large, and electrons can be injected from the source contact into the nanowire junction with a large kinetic energy and a large forward momentum collimation phenomenon, making surface imperfection scattering and large-angle Coulomb impurity scattering less probable for the electrons traversing through the junction region. Thus, the device turns to show some signature of ballistic electron transport at large biases in this range of applied rather large negative back-gate voltages. For the electron collimation observed in a lateral
    • R shows a well-defined down-bending behavior, indicating a transition to ballistic transport. We attribute this diffusive-to-ballistic transport transition to a bias induced scattering length enhancement effect. Outside the flat plateau region, the bias voltage applied between the left and right electrodes is large, and electrons can be injected from the source contact into the nanowire junction with a large kinetic energy and a large forward momentum (collimation phenomenon), making surface imperfection scattering and large-angle Coulomb impurity scattering less probable for the electrons traversing through the junction region. Thus, the device turns to show some signature of ballistic electron transport at large biases in this range of applied rather large negative back-gate voltages. For the electron collimation observed in a lateral point contact device, see: Molenkamp, L. W.; Staring, A. A. M.; Beenakker, C. W. J.; Eppenga, R.; Timmering, C. E.; Williamson, J. G.; Harmans, C. J. P. M.; Foxon, C. T. Phys. Rev. B 1990, 41, 1274.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.