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Microsystem Technologies

Volumn 2, Issue 1, 1995, Pages 50-55

The effect of residual solvent on the profiles of thick positive DNO-photoresist for microsystem technologies

(4) Schulz, J a Mono, T a Chung, S J a Mohr, J a

a KARLSRUHE INSTITUTE OF TECHNOLOGY (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 51649143997 PISSN: 09467076 EISSN: 14321858 Source Type: Journal
DOI: 10.1007/BF02739530 Document Type: Article

Times cited : (2)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.