On the morphological instability of silicon/silicon dioxide nanowires (Applied Physics A: Materials Science and Processing (2005) 80 (1405-1408) DOI:10.1007/s00339-004-3188-7)

Applied Physics A: Materials Science and Processing

Volumn 93, Issue 2, 2008, Pages 577-

  Kolb, F M ^a   Hofmeister, H ^a   Zacharias, M ^a   Gosele U ^a  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

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EID: 51649124452     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-008-4801-y     Document Type: Erratum

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