Separation method of hole trapping and interface trap generation and their roles in NBTI reaction-diffusion model

IEEE International Reliability Physics Symposium Proceedings

Volumn , Issue , 2008, Pages 745-746

  Lee, J H ^a   Wu, W H ^a   Islam, A E ^b   Alam, M A ^b   Oates, A S ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

^b PURDUE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 51549119555     PISSN: 15417026     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/RELPHY.2008.4559018     Document Type: Conference Paper

References (9)

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4. H. Reisinger et al., IRPS 2006, p. 448.
5. C. Shen et al., IEDM 2006, p. 337.
6. S. Mahapatra et al., IRPS 2007, p. 1.
7. H. Kufluoglu et al., TED, p. 1101, 2007.
8. A. E. Islam et al., TED, p. 2143, 2007., p. 273.
9. V. Huard et al., IRPS 2004, p. 40.