-
1
-
-
1242321031
-
-
0040-6090 10.1016/j.tsf.2003.10.022.
-
I. M. Chan and F. C. Hong, Thin Solid Films 0040-6090 10.1016/j.tsf.2003.10.022 450, 304 (2004).
-
(2004)
Thin Solid Films
, vol.450
, pp. 304
-
-
Chan, I.M.1
Hong, F.C.2
-
2
-
-
27844595934
-
-
0021-8979 10.1063/1.2123375.
-
S. Y. Kim, J. M. Baik, H. K. Yu, and J. L. Lee, J. Appl. Phys. 0021-8979 10.1063/1.2123375 98, 093707 (2005).
-
(2005)
J. Appl. Phys.
, vol.98
, pp. 093707
-
-
Kim, S.Y.1
Baik, J.M.2
Yu, H.K.3
Lee, J.L.4
-
3
-
-
20544451518
-
-
0379-6779 10.1016/j.synthmet.2005.03.019.
-
J. Li, M. Yahiro, K. Ishida, H. Yamada, and K. Matsushige, Synth. Met. 0379-6779 10.1016/j.synthmet.2005.03.019 151, 141 (2005).
-
(2005)
Synth. Met.
, vol.151
, pp. 141
-
-
Li, J.1
Yahiro, M.2
Ishida, K.3
Yamada, H.4
Matsushige, K.5
-
4
-
-
0037445024
-
-
0021-8979 10.1063/1.1556184.
-
C. F. Qiu, Z. L. Xie, H. Y. Chen, M. Wong, and H. S. Kwok, J. Appl. Phys. 0021-8979 10.1063/1.1556184 93, 3253 (2003).
-
(2003)
J. Appl. Phys.
, vol.93
, pp. 3253
-
-
Qiu, C.F.1
Xie, Z.L.2
Chen, H.Y.3
Wong, M.4
Kwok, H.S.5
-
5
-
-
79956009067
-
-
0003-6951 10.1063/1.1469697.
-
W. Hu, K. Manabe, T. Furukawa, and M. Matsumura, Appl. Phys. Lett. 0003-6951 10.1063/1.1469697 80, 2640 (2002).
-
(2002)
Appl. Phys. Lett.
, vol.80
, pp. 2640
-
-
Hu, W.1
Manabe, K.2
Furukawa, T.3
Matsumura, M.4
-
6
-
-
34547917250
-
-
S. Wang, T. Osasa, and M. Matsumura, Jpn. J. Appl. Phys., Part 1 45, 8894 (2006).
-
(2006)
Jpn. J. Appl. Phys., Part 1
, vol.45
, pp. 8894
-
-
Wang, S.1
Osasa, T.2
Matsumura, M.3
-
7
-
-
50849115239
-
-
0935-9648 10.1002/adma.200701812.
-
C. Di, G. Yu, Y. Liu, Y. Guo, Y. Wang, W. Wu, and D. Zhu, Adv. Mater. (Weinheim, Ger.) 0935-9648 10.1002/adma.200701812 20, 1286 (2008).
-
(2008)
Adv. Mater. (Weinheim, Ger.)
, vol.20
, pp. 1286
-
-
Di, C.1
Yu, G.2
Liu, Y.3
Guo, Y.4
Wang, Y.5
Wu, W.6
Zhu, D.7
-
8
-
-
33646173273
-
-
0003-6951 10.1063/1.2194315.
-
A. Mittiga, E. Salza, F. Sarto, M. Tucci, and R. Vasanthi, Appl. Phys. Lett. 0003-6951 10.1063/1.2194315 88, 163502 (2006).
-
(2006)
Appl. Phys. Lett.
, vol.88
, pp. 163502
-
-
Mittiga, A.1
Salza, E.2
Sarto, F.3
Tucci, M.4
Vasanthi, R.5
-
9
-
-
3643076747
-
-
0163-1829 10.1103/PhysRevB.38.11322.
-
J. Ghijsen, L. H. Tjeng, J. van Elp, H. Eskes, J. Westerink, G. A. Sawatzky, and M. T. Czyzyk, Phys. Rev. B 0163-1829 10.1103/PhysRevB.38.11322 38, 11322 (1988).
-
(1988)
Phys. Rev. B
, vol.38
, pp. 11322
-
-
Ghijsen, J.1
Tjeng, L.H.2
Van Elp, J.3
Eskes, H.4
Westerink, J.5
Sawatzky, G.A.6
Czyzyk, M.T.7
-
10
-
-
0003099302
-
-
0009-2614 10.1016/S0009-2614(98)01277-9.
-
J. C. Scott and G. G. Malliaras, Chem. Phys. Lett. 0009-2614 10.1016/S0009-2614(98)01277-9 299, 115 (1999).
-
(1999)
Chem. Phys. Lett.
, vol.299
, pp. 115
-
-
Scott, J.C.1
Malliaras, G.G.2
-
11
-
-
0037599324
-
-
0734-2101 10.1116/1.1559919.
-
J. C. Scott, J. Vac. Sci. Technol. A 0734-2101 10.1116/1.1559919 21, 521 (2003).
-
(2003)
J. Vac. Sci. Technol. A
, vol.21
, pp. 521
-
-
Scott, J.C.1
-
13
-
-
0001497114
-
-
0021-8979 10.1063/1.371578.
-
R. Schlaf, C. D. Merritt, L. A. Crisafulli, and Z. H. Kafafi, J. Appl. Phys. 0021-8979 10.1063/1.371578 86, 5678 (1999).
-
(1999)
J. Appl. Phys.
, vol.86
, pp. 5678
-
-
Schlaf, R.1
Merritt, C.D.2
Crisafulli, L.A.3
Kafafi, Z.H.4
-
14
-
-
0000733451
-
-
0021-8979 10.1063/1.370920.
-
R. Schlaf, P. G. Schroeder, M. W. Nelson, and B. A. Parkinson, J. Appl. Phys. 0021-8979 10.1063/1.370920 86, 1499 (1999).
-
(1999)
J. Appl. Phys.
, vol.86
, pp. 1499
-
-
Schlaf, R.1
Schroeder, P.G.2
Nelson, M.W.3
Parkinson, B.A.4
-
15
-
-
33751567885
-
-
0003-6951 10.1063/1.2398901.
-
S. Y. Kim and J. L. Lee, Appl. Phys. Lett. 0003-6951 10.1063/1.2398901 89, 223515 (2006).
-
(2006)
Appl. Phys. Lett.
, vol.89
, pp. 223515
-
-
Kim, S.Y.1
Lee, J.L.2
-
17
-
-
37349068601
-
-
S. S. Jeong, A. Mittiga, E. Salza, A. Masci, and S. Passerini, Electrochim. Acta 53, 2226 (2008).
-
(2008)
Electrochim. Acta
, vol.53
, pp. 2226
-
-
Jeong, S.S.1
Mittiga, A.2
Salza, E.3
Masci, A.4
Passerini, S.5
|