Exponential structural relaxation of a high purity silica glass

Journal of Non-Crystalline Solids

Volumn 354, Issue 40-41, 2008, Pages 4685-4690

  Tomozawa, M ^a   Koike, A ^a   Ryu, S R ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

FTIR measurements; Glass transition; Silica; Structural relaxation

Indexed keywords

SILICA;

FICTIVE TEMPERATURES; FTIR MEASUREMENTS; GLASS TRANSITION; HIGH-PURITY; SILICA GLASSES;

STRUCTURAL RELAXATION;

EID: 51349136570     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2008.07.005     Document Type: Article

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