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Volumn , Issue , 2008, Pages 1294-1299

Development of low temperature bonding using in-based solders

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONIC COMPONENTS; LOW-TEMPERATURE BONDING;

EID: 51349084691     PISSN: 05695503     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ECTC.2008.4550142     Document Type: Conference Paper
Times cited : (34)

References (14)
  • 1
    • 34250860025 scopus 로고    scopus 로고
    • Development of 3D-Packaging Process Technology for Stacked Memory Chips
    • 0970-Y03-06
    • I.T. Mitsuhashi et al., "Development of 3D-Packaging Process Technology for Stacked Memory Chips", Mater. Res. Soc. Symp. Proc. Vol. 970 (2007), 0970-Y03-06.
    • (2007) Mater. Res. Soc. Symp. Proc , vol.970
    • Mitsuhashi, I.T.1
  • 2
    • 0035300622 scopus 로고    scopus 로고
    • K. Takahashi et al., Current Status of Research and Development for Three-Dimensional Chip Stack Technology, Jpn J. Appl. Phys., 40 (2001), pp. 3032-3027 Part 1 No 4B (2001), pp. 3032-3037.
    • K. Takahashi et al., "Current Status of Research and Development for Three-Dimensional Chip Stack Technology", Jpn J. Appl. Phys., Vol 40 (2001), pp. 3032-3027 Part 1 No 4B (2001), pp. 3032-3037.
  • 3
    • 4444275224 scopus 로고    scopus 로고
    • Vertical System Integration by Using Inter-Chip Vias and Solid-Liquid Interdiffusion Bonding
    • A. Klumpp et al, "Vertical System Integration by Using Inter-Chip Vias and Solid-Liquid Interdiffusion Bonding", Jpn J of Appl. Phys., Vol. 43, No. 7A (2004), pp. L829-L830.
    • (2004) Jpn J of Appl. Phys , vol.43 , Issue.7 A
    • Klumpp, A.1
  • 4
    • 0035304419 scopus 로고    scopus 로고
    • Microstracture examination of copper wafer bonding
    • K.-E. Chen et al, "Microstracture examination of copper wafer bonding", J. Electron. Mater., Vol. 30, No. 4 (2001), pp.331-335.
    • (2001) J. Electron. Mater , vol.30 , Issue.4 , pp. 331-335
    • Chen, K.-E.1
  • 5
    • 33646236322 scopus 로고    scopus 로고
    • Three-dimensional wafer stacking via Cu-Cu bonding integrated with 65-nm strained-Si/low-k CMOS technology
    • P. R. Morrow et al, "Three-dimensional wafer stacking via Cu-Cu bonding integrated with 65-nm strained-Si/low-k CMOS technology", IEEE Electron Device Letters, Vol. 27, No. 5 (2006), pp. 335-337.
    • (2006) IEEE Electron Device Letters , vol.27 , Issue.5 , pp. 335-337
    • Morrow, P.R.1
  • 6
    • 0033897583 scopus 로고    scopus 로고
    • Interfacial Reactions between Liquid Indium and Au-Deposited Substrates
    • Y. M. Liu and T. H. Chuang, "Interfacial Reactions between Liquid Indium and Au-Deposited Substrates", J. of Electron. Mater., Vol. 29, No. 4 (2000), pp. 405-410.
    • (2000) J. of Electron. Mater , vol.29 , Issue.4 , pp. 405-410
    • Liu, Y.M.1    Chuang, T.H.2
  • 10
    • 51349135889 scopus 로고    scopus 로고
    • L. Yan et al, A Hermetic Package Bonded at Low Temperature with Cu/In/Sn/Cu Joint, To be presented in the 58th Electronic Components and Technology Conference (2008).
    • L. Yan et al, "A Hermetic Package Bonded at Low Temperature with Cu/In/Sn/Cu Joint", To be presented in the 58th Electronic Components and Technology Conference (2008).
  • 11
    • 51649142132 scopus 로고
    • Intermetallic compound layer formation between copper and hot-dipped 100In, 50In-50Sn, 100Sn, and 63Sn-37Pb coatings
    • P.T. Vianco et al., "Intermetallic compound layer formation between copper and hot-dipped 100In, 50In-50Sn, 100Sn, and 63Sn-37Pb coatings", J. Electron. Mater., Vol. 23, (1994), pp. 583-594.
    • (1994) J. Electron. Mater , vol.23 , pp. 583-594
    • Vianco, P.T.1
  • 12
    • 0019035323 scopus 로고
    • Room Temperature Interactions in Copper-Metal Thin Film Couples
    • V. Simic and Z. Marinkovic, "Room Temperature Interactions in Copper-Metal Thin Film Couples", J of the Less-Common Metals, Vol. 72 (1980), pp. 133-140.
    • (1980) J of the Less-Common Metals , vol.72 , pp. 133-140
    • Simic, V.1    Marinkovic, Z.2
  • 13
    • 0027608249 scopus 로고
    • Structural Characterization of the CuIn Intermetallic Phase Produced by Interfacial Reactions in Cu/In Bimetallic Films
    • Rita Roy et al, "Structural Characterization of the CuIn Intermetallic Phase Produced by Interfacial Reactions in Cu/In Bimetallic Films", Thin Solid Films, Vol. 229 (1993), pp. 140-142.
    • (1993) Thin Solid Films , vol.229 , pp. 140-142
    • Roy, R.1
  • 14
    • 0026997747 scopus 로고
    • Low Temperature Transient Liquid Phase (LLTLP) Bonding for Au/Cu and Cu/Cu Interconnections
    • M. M. Hou and T. W. Eaga, "Low Temperature Transient Liquid Phase (LLTLP) Bonding for Au/Cu and Cu/Cu Interconnections", J. of Electron. Pac., vol. 114, (1992), pp. 443-447.
    • (1992) J. of Electron. Pac , vol.114 , pp. 443-447
    • Hou, M.M.1    Eaga, T.W.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.