Electrical and optical properties of μc-SiH films

Bulletin of Materials Science

Volumn 8, Issue 3, 1986, Pages 267-277

  Dubey, G C ^a   Singh, R A ^a   Mukherjee, S N ^a   Pal, Surendra ^a   Rao, M G ^a  

^a SOLID STATE PHYSICS LABORATORY   (India)

Author keywords

Amorphous silicon; plasma deposition; solar cells; thin films

Indexed keywords

EID: 51249178035     PISSN: 02504707     EISSN: 09737669     Source Type: Journal    
DOI: 10.1007/BF02744132     Document Type: Article

References (14)

1. Kaya H, Imura T, Kusao T, Hiraki A, Nakamura O, Okayasu Y and Matsumura M 1984 Jpn. J. Appl. Phys.23 L549
2. The dynamics of photoexcited carriers in microcrystalline silicon
3. Formation kinetics and control of microcrystallite in μc-Si:H from glow discharge plasma
4. Properties of microcrystalline P doped Si:H films
5. A study of hydrogenated amorphous silicon deposited by rf glow discharge in silane-hydrogen mixtures
6. The preparation of thin layers of Ge and Si by chemical hydrogen plasma transport