Low frequency electromigration noise and film microstructure in Al/Si stripes: Electrical measurements and TEM analysis

Journal of Electronic Materials

Volumn 22, Issue 11, 1993, Pages 1323-1326

  Ciofi, C ^a   Diligenti, A ^a   Giacomozzi, F ^b   Nannini, A ^a   Neri, B ^a  

^a UNIVERSITY OF PISA   (Italy)

^b ITC IRST   (Italy)

Author keywords

Electromigration; noise; TEM; temperature coefficient

Indexed keywords

EID: 51249163870     PISSN: 03615235     EISSN: 1543186X     Source Type: Journal    
DOI: 10.1007/BF02817694     Document Type: Article

References (10)

1. Electromigration and low-frequency resistance fluctuations in aluminum thin-film interconnections