Experimental investigation of a PtSi source and drain field emission transistor

Applied Physics Letters

Volumn 67, Issue , 1995, Pages 1420-

  Snyder, John P ^a   Helms, C R ^a   Nishi, Yoshio ^b  

^a STANFORD UNIVERSITY   (United States)

^b HEWLETT PACKARD COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 51149208592     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.114513     Document Type: Article

References (0)