Comment on "Iron diffusivity in silicon: Impact of charge state" [Appl. Phys. Lett. 66, 860 (1995)]

Applied Physics Letters

Volumn , Issue , 1995, Pages 1868-

  Heiser, T ^a   Mesli, A ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 51149206797     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (0)