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Volumn 2, Issue , 2008, Pages 818-822

Development of new respirator fit panels in computer supported cooperative design for the Chinese

Author keywords

Collaborative design; CSCW; Ergonomics; Respirator fit panels

Indexed keywords

ANTHROPOMETRY; COMPUTER NETWORKS; GROUPWARE; INTERACTIVE COMPUTER SYSTEMS; POPULATION STATISTICS; SURVEYS;

EID: 51049094670     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/CSCWD.2008.4537084     Document Type: Conference Paper
Times cited : (3)

References (12)
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  • 3
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    • Han, D.H.1    Choi, K.L.2
  • 4
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    • Kim, H.1    Han, D.H.2    Roh, Y.M.3    Kim, K.4    Park, Y.G.5
  • 5
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    • Head and facial anthropometry of mixedrace U.S. army male soldiers for military design and sizing: A pilot study
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  • 8
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  • 9
    • 0025281542 scopus 로고
    • Half-mask respirator selection for a mixed worker group
    • S.F. Gross and S.W. Horstman, "Half-mask respirator selection for a mixed worker group", App Occup Environ Hyg, 1990, 5:229-235.
    • (1990) App Occup Environ Hyg , vol.5 , pp. 229-235
    • Gross, S.F.1    Horstman, S.W.2
  • 10
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    • Oestenstad, R.K.1    Perkins, L.L.2
  • 11
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  • 12
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.