Characterization of power-line filters and electronic equipment for prediction of conducted emissions

IEEE Transactions on Electromagnetic Compatibility

Volumn 50, Issue 3 PART 2, 2008, Pages 577-585

  Pérez, Antonio ^a   Sánchez, Albert Miquel ^a   Regué, Joan Ramon ^a   Ribó, Miquel ^a   Rodríguez Cepeda, Pablo ^a   Pajares, Francisco Javier ^a  

^a UNIVERSITAT RAMON LLULL   (Spain)

Author keywords

Common mode; Conducted emissions; Conducted interference; Differential mode; Equivalent circuit; Input impedance; Power line filter (PLF); Power line network; S parameters

Indexed keywords

COMPUTER SOFTWARE SELECTION AND EVALUATION; ELECTRONIC EQUIPMENT; FORECASTING; THERMOELECTRIC EQUIPMENT; WAVE FILTERS;

COMMON MODE; CONDUCTED EMISSIONS; CONDUCTED INTERFERENCE; DIFFERENTIAL MODE; EQUIVALENT CIRCUIT; INPUT IMPEDANCE; POWER-LINE FILTER (PLF); POWER-LINE NETWORK; S-PARAMETERS;

OSCILLATORS (ELECTRONIC);

EID: 50949166642     PISSN: 00189375     EISSN: None     Source Type: Journal    
DOI: 10.1109/TEMC.2008.926891     Document Type: Article

References (17)

1. ANSI C63.13, American National Standard Guide on the Application and Evaluation of EMI Power-Line Filters for Commercial Use, Amer. Nat. Standards Inst., Washington, DC, Jun. 28, 1991.
2. B. Garry and R. Nelson, "Effect of impedance and frequency variation on insertion loss for a typical power-line filter," in Proc. IEEE Symp. EMC, Denver, CO, vol. 2, pp. 691-695, Aug. 24-28, 1998.
3. M. Zamazal and T. Urbanec, "Variable impedance in measuring EMI filter's insertion loss," in Proc. Asia-Pacific Conf. Commun., Oct. 3-5, 2005, 2008, pp. 24-27.
4. J. G. Kraemer, "S-parameter characterization for EMI filters," in Proc. IEEE Symp. EMC, vol. 1, pp. 361-366, AUg. 18-22, 2003.
5. A. Axelrod, "Experimental study of DM-to-CM and vice-versa conversion effects in balanced signal and power-line filters," in Proc. IEEE Symp. EMC, vol. 1, pp.599-602, May 11-16, 2003.
6. M. Kumar and V. Agarwal, "Power-line filter design for conducted electromagnetic interference using time-domain measurements," IEEE Trans. Electromagn. Compat., vol. 48, no. 1, pp. 178-186, Feb. 2006.
7. K. Y. See and L. Yang, "Measurement of noise source impedance of SMPS using two current probes," Inst. Electr. Eng. Electron. Lett., vol. 36, no. 21, pp. 1774-1776, Oct. 2000.
8. D. Zhang, D. Y. Chen, M. J. Nave, and D. Sable, "Measurement of noise source impedance of off-line converters," IEEE Trans. Power Electron., vol. 15, no. 5, pp. 820-825, Sep. 2000.
9. J. R. Regué, M. Ribó, D. Duran, D. Badia, and A. Pérez, "Common and differential-mode characterization of EMI power-line filters from S-parameters measurements, in Proc. IEEE Symp. EMC, vol. 2, pp. 610-615, Aug. 9-13, 2004.
10. J. R. Regué, M. Ribó, D. Duran, D. Badia, and A. Pérez, "Measurement and modeling of noise source impedance of electronic equipment," in Proc. 6th EMC Eur. Int. Symp., Eindhoven, The Netherlands, Sep. 6-10, 2004, pp. 150-154.
11. A. Pérez, J. R. Regué, M. Ribó, A. M. Sánchez, F. J. Pajares, and D. Badia, "Circuital characterization of an electronic equipment for narrow-band conducted emissions," in Proc. 7th EMC Eur. Int. Symp., Barcelona, Spain, Sep. 5-8, 2006, pp. 1035-1040.
12. A. M. Sánchez, A. Perez, J. R. Regué, M. Ribó, P. Rodríguez-Cepeda, and F. J. Pajares, "Optimization of the scattering parameter measurement of electronic equipment with conducted emissions," presented at the EMC Eur. Workshop, Paris, France, Jun. 14-15, 2007.
13. H. L. Su and K. H. Lin, "Computer-aided design of power line filters with a low cost common and differential-mode noise diagnostic circuit," in Proc. IEEE Symp. EMC, vol. 1, pp. 511-516, Aug. 13-17, 2001.
14. D. M. Pozar, Microwave Engineering. Hoboken, NJ: Wiley, 1998.
15. H. Rothe and W. Dahlke, "Theory of noisy fourpoles," in Proc. IRE Jun. 1956, pp. 811-818.
16. CISPR 22, Information Technology Equipment - Radio Disturbance Characteristics - Limits and Methods of Measurement, Int. Electrotech. Comm., Nov. 1997.
17. CISPR 16, Specification for Radio Disturbance and Immunity Measuring Apparatus and Methods, Int. Electrotech. Comm., Geneva, Switzerland, Nov. 2003.