Enhanced chemical immunity for negative electron affinity GaAs photoemitters

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 26, Issue 5, 2008, Pages 1195-1197

  Mulhollan, G A ^a   Bierman, J C ^a  

^a Saxet Surface Science   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION PROCESSING; BACKGROUND PRESSURE; NEGATIVE ELECTRON AFFINITIES; ULTRAHIGH-VACUUM CONDITIONS;

ALKALINITY; CESIUM; LITHIUM; METALLIC GLASS; SEMICONDUCTING GALLIUM; VACUUM;

ELECTRON AFFINITY;

EID: 50849131649     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2965816     Document Type: Article

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