Preparation of MgF2-SiO2 thin films with a low refractive index by a solgel process

Applied Optics

Volumn 47, Issue 13, 2008, Pages

  Ishizawa, Hitoshi ^a   Niisaka, Shunsuke ^a   Murata, Tsuyoshi ^a   Tanaka, Akira ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANTIREFLECTION COATINGS; FILM PREPARATION; SHOTCRETING; THIN FILMS;

ANTI REFLECTIVE COATINGS; CURVED SUBSTRATES; DRY PROCESS; ENVIRONMENTAL RESISTANCE; LOW REFRACTIVE INDEX; LOW TEMPERATURES; PROCESSING CONDITION;

REFRACTIVE INDEX;

EID: 50849102686     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.47.00C200     Document Type: Article

References (6)

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3. I. M. Thomas, "Method for the preparation of porous silica antireflection coatings varying in refractive index from 1.22 to 1.44," Appl. Opt. 31, 6145-6149 (1992).
4. 2 coatings prepared from sol solutions treated by autoclaving," presented at the International Chemical Congress of the Pacific Basin Societies, INOR 743, Honolulu, 14-19 December 2000.
5. 2 thin films with variable refractive index," presented at the 13th International Workshop on Sol-Gel Science & Technology, P80, Los Angeles, 21-26 August 2005.
6. T. Murata, H. Ishizawa, I. Motoyama, and A. Tanaka, "Preparation of high-performance optical coatings with fluoride nanoparticle films made from autoclaved sol," Appl. Opt. 45, 1465-1468 (2006).