Low temperature deposition of indium tin oxide films by plasma ion-assisted evaporation

Applied Optics

Volumn 47, Issue 13, 2008, Pages

  Füchsel, Kevin ^a,b   Schulz, Ulrike ^b   Kaiser, Norbert ^b   Tünnermann, Andreas ^a,b  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^b FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; EVAPORATION; INDIUM; ION BEAM ASSISTED DEPOSITION; OPTICAL PROPERTIES; SUBSTRATES; TEMPERATURE; THIN FILMS; TIN; TIN OXIDES; X RAY DIFFRACTION;

CLASSICAL DRUDE THEORY; FOUR-POINT MEASUREMENTS; HIGH THERMAL STABILITY; INDIUM TIN OXIDE FILMS; LOW-TEMPERATURE DEPOSITION; PLASMA ION-ASSISTED EVAPORATION; TRANSPARENT CONDUCTIVE OXIDES; X-RAY DIFFRACTION SPECTROSCOPY;

OXIDE FILMS;

EID: 50849102684     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.47.00C297     Document Type: Article

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