-
1
-
-
2442474811
-
Transparente und leitfähige Oxidschichten
-
B. Szyszka, Transparente und leitfähige Oxidschichten, Vakuum in Forschung und Praxis (2001), Nr. 1, 38-45.
-
(2001)
Vakuum in Forschung und Praxis
, Issue.1
, pp. 38-45
-
-
Szyszka, B.1
-
2
-
-
54949120822
-
-
M. Weigert, Sputtertargets für TCO-Anwendungen: Stand der Technik und neue Entwicklungen, Forschungsverbund Sonnenenergie, Workshop: TCO für Dünnschicht-Solarzellen II, Jülich, 16. - 17.09.2002, Hrsg. B. Rech und G. Stadermann, ISSN: 0949-1082.
-
M. Weigert, Sputtertargets für TCO-Anwendungen: Stand der Technik und neue Entwicklungen, Forschungsverbund Sonnenenergie, Workshop: "TCO für Dünnschicht-Solarzellen II", Jülich, 16. - 17.09.2002, Hrsg. B. Rech und G. Stadermann, ISSN: 0949-1082.
-
-
-
-
3
-
-
0030195582
-
ITO films for antireflective and antistatic tube coatings prepared by d.c. magnetron sputtering
-
H. P. Löbl, M. Huppertz, D. Mergel, ITO films for antireflective and antistatic tube coatings prepared by d.c. magnetron sputtering, Surface & Coatings Technology 82 (1996) 90-8.
-
(1996)
Surface & Coatings Technology
, vol.82
, pp. 90-98
-
-
Löbl, H.P.1
Huppertz, M.2
Mergel, D.3
-
4
-
-
2942612660
-
-
3:Sn films, J. Appl. Phys. 95 (2004) 5608-15.
-
3:Sn films, J. Appl. Phys. 95 (2004) 5608-15.
-
-
-
-
5
-
-
0000531083
-
-
3:Sn prepared by radio frequency sputtering, J. Appl. Phys. 88 (2000) 2437-42.
-
3:Sn prepared by radio frequency sputtering, J. Appl. Phys. 88 (2000) 2437-42.
-
-
-
-
6
-
-
0035939504
-
-
3:Sn films prepared by radio-frequency diode sputtering, Thin Solid Films 392 (2001)91-97.
-
3:Sn films prepared by radio-frequency diode sputtering, Thin Solid Films 392 (2001)91-97.
-
-
-
-
7
-
-
0020115402
-
Electrical properties and defect model of tin-doped indium oxide layers
-
G. Frank, H. Köstlin, Electrical properties and defect model of tin-doped indium oxide layers, Appl. Phys. A 27 (1982) 197-206.
-
(1982)
Appl. Phys. A
, vol.27
, pp. 197-206
-
-
Frank, G.1
Köstlin, H.2
-
8
-
-
0032614640
-
-
D. C. Paine, T. Whitson, D. Jania, R. Beresford, l Cleva-Ow-Yang, B. Lewis, A study of low temperature crystallization of amorphous thin film indium-tin-oxide, J. Appl. Phys. 85 (1999) 8445-50.
-
D. C. Paine, T. Whitson, D. Jania, R. Beresford, l Cleva-Ow-Yang, B. Lewis, A study of low temperature crystallization of amorphous thin film indium-tin-oxide, J. Appl. Phys. 85 (1999) 8445-50.
-
-
-
-
9
-
-
0037439419
-
Effect of microstructures on nanocrystallite nucleation and growth in hydrogenated amorphous indium-tinoxide films
-
M. Ando, E. Nishimura, K. Onisawa, T. Minemura, Effect of microstructures on nanocrystallite nucleation and growth in hydrogenated amorphous indium-tinoxide films, J. Appl. Phys. 93 (2003) 1032-8.
-
(2003)
J. Appl. Phys
, vol.93
, pp. 1032-1038
-
-
Ando, M.1
Nishimura, E.2
Onisawa, K.3
Minemura, T.4
-
11
-
-
0024055160
-
Variations in structural and electrical properties of magnetronsputtered indium tin oxide films with deposition parameters
-
J. Dutta, S. Ray, Variations in structural and electrical properties of magnetronsputtered indium tin oxide films with deposition parameters, Thin Solid Films 162 (1988) 119-127.
-
(1988)
Thin Solid Films
, vol.162
, pp. 119-127
-
-
Dutta, J.1
Ray, S.2
-
12
-
-
0035386094
-
Reactive magnetron sputtering of tin-doped indium oxide (ITO) : Influence of argon pressure and plasma excitation mode
-
A. Mientus, K. Ellmer, Reactive magnetron sputtering of tin-doped indium oxide (ITO) : influence of argon pressure and plasma excitation mode, Surface & Coatings Technology 142-144 (2001) 748-54.
-
(2001)
Surface & Coatings Technology
, vol.142-144
, pp. 748-754
-
-
Mientus, A.1
Ellmer, K.2
-
13
-
-
19844378716
-
-
3:Sn films, Thin Solid Films 484 (2005) 146-153.
-
3:Sn films, Thin Solid Films 484 (2005) 146-153.
-
-
-
-
14
-
-
29144480910
-
3:Sn films prepared by direct-current and radio-frequency magnetron sputtering
-
3:Sn films prepared by direct-current and radio-frequency magnetron sputtering, J. Mater. Res. 20 (2005) 2503-9.
-
(2005)
J. Mater. Res
, vol.20
, pp. 2503-2509
-
-
Mergel, D.1
Thiele, K.2
Qiao, Z.3
-
16
-
-
0037150128
-
-
3:Sn films, J. Phys. D: Appl. Phys. 35 (2002) 794 - 801.
-
3:Sn films, J. Phys. D: Appl. Phys. 35 (2002) 794 - 801.
-
-
-
-
17
-
-
28044454791
-
Dielectric modeling of transmittance spectra of thin ZnO:Al films
-
Z. Qiao, C. Agashe, D. Mergel, Dielectric modeling of transmittance spectra of thin ZnO:Al films, Thin Solid Films 496/2 (2006) 520-555.
-
(2006)
Thin Solid Films
, vol.496
, Issue.2
, pp. 520-555
-
-
Qiao, Z.1
Agashe, C.2
Mergel, D.3
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