메뉴 건너뛰기




Volumn 52, Issue 10, 2008, Pages 1482-1485

Design and optimization of the SOI field effect diode (FED) for ESD protection

Author keywords

Electrostatic discharge protection, ESD; Field effect diode, FED; PNPN

Indexed keywords

CARRIER LIFETIME; COMPUTER SIMULATION; ELECTRIC BREAKDOWN; ELECTRIC CONDUCTIVITY; ELECTROSTATIC DEVICES; ELECTROSTATIC DISCHARGE; FIELD EMISSION DISPLAYS; IONIZATION OF GASES; NONMETALS; SILICON;

EID: 50849098483     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2008.06.033     Document Type: Article
Times cited : (30)

References (14)
  • 1
    • 17644429042 scopus 로고    scopus 로고
    • Greenlaw D et al. Taking SOI substrates and low-k dielectrics into high-volume microprocessor production. In: IEDM technical digest; 2003. p. 277-80.
    • Greenlaw D et al. Taking SOI substrates and low-k dielectrics into high-volume microprocessor production. In: IEDM technical digest; 2003. p. 277-80.
  • 2
    • 46149123461 scopus 로고    scopus 로고
    • Salman AA et al. Field effect diode (FED): a novel device for ESD protection in deep sub-micron SOI technologies. In: IEDM technical digest; 2006. p. 109-12.
    • Salman AA et al. Field effect diode (FED): a novel device for ESD protection in deep sub-micron SOI technologies. In: IEDM technical digest; 2006. p. 109-12.
  • 3
    • 33744758910 scopus 로고    scopus 로고
    • Ershov M et al. Optimization of substrate doping for back-gate control in SOI T-RAM memory technology. In: SOI conference; 2005. p. 215-6.
    • Ershov M et al. Optimization of substrate doping for back-gate control in SOI T-RAM memory technology. In: SOI conference; 2005. p. 215-6.
  • 4
    • 21644448083 scopus 로고    scopus 로고
    • Nemati F et al. Fully planar 0.562/spl mu/m/sup 2/T-RAM cell in a 130 nm SOI CMOS logic technology for high-density high-performance SRAMs. In: IEDM technical digest; 2004. p. 273-6.
    • Nemati F et al. Fully planar 0.562/spl mu/m/sup 2/T-RAM cell in a 130 nm SOI CMOS logic technology for high-density high-performance SRAMs. In: IEDM technical digest; 2004. p. 273-6.
  • 5
    • 0031644049 scopus 로고    scopus 로고
    • Nemati F et al. A novel high density, low voltage SRAM cell with a vertical NDR device. In: VLSI technology; 1998. p. 66-7.
    • Nemati F et al. A novel high density, low voltage SRAM cell with a vertical NDR device. In: VLSI technology; 1998. p. 66-7.
  • 6
    • 0033314262 scopus 로고    scopus 로고
    • Nemati F et al. A novel thyristor-based SRAM cell (T-RAM) for high-speed, low-voltage, giga-scale memories. In: IEDM technical digest; 1999. p. 283-6.
    • Nemati F et al. A novel thyristor-based SRAM cell (T-RAM) for high-speed, low-voltage, giga-scale memories. In: IEDM technical digest; 1999. p. 283-6.
  • 7
    • 43749098069 scopus 로고    scopus 로고
    • Yang KJ et al. Optimization of nanoscale thyristors on SOI for high-performance high-density memories. In: SOI conference; 2006. p. 113-4.
    • Yang KJ et al. Optimization of nanoscale thyristors on SOI for high-performance high-density memories. In: SOI conference; 2006. p. 113-4.
  • 8
    • 50849089643 scopus 로고    scopus 로고
    • Sentaurus TCAD. v.2007.03 ed: Synopsys Inc.
    • Sentaurus TCAD. v.2007.03 ed: Synopsys Inc.
  • 9
    • 0024105667 scopus 로고
    • A physically based mobility model for numerical simulation of nonplanar devices
    • Lombardi C., et al. A physically based mobility model for numerical simulation of nonplanar devices. IEEE Trans Comput Aided Des Integr Circ Syst 7 (1988) 1164-1171
    • (1988) IEEE Trans Comput Aided Des Integr Circ Syst , vol.7 , pp. 1164-1171
    • Lombardi, C.1
  • 10
    • 0026899612 scopus 로고
    • A unified mobility model for device simulation - I. Model equations and concentration dependence
    • Klaassen D.B.M. A unified mobility model for device simulation - I. Model equations and concentration dependence. Solid-State Electron 35 (1992) 953-959
    • (1992) Solid-State Electron , vol.35 , pp. 953-959
    • Klaassen, D.B.M.1
  • 14
    • 34250693116 scopus 로고    scopus 로고
    • Di Sarro J et al. Study of design factors affecting turn-on time of silicon controlled rectifiers (SCRS) in 90 and 65 nm bulk CMOS technologies. In: Proceedings of the international reliability physics symposium; 2006. p. 163-8.
    • Di Sarro J et al. Study of design factors affecting turn-on time of silicon controlled rectifiers (SCRS) in 90 and 65 nm bulk CMOS technologies. In: Proceedings of the international reliability physics symposium; 2006. p. 163-8.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.