Amorphous ferromagnetic layers for magnetic tunnel junctions

Institute of Physics Conference Series

Volumn 179, Issue , 2004, Pages 49-52

  Warot, B ^a   Imrie, J ^a   Petford Long, A K ^a   Sharma, M ^b   Anthony, T C ^b  

^a UNIVERSITY OF OXFORD   (United Kingdom)

^b HEWLETT PACKARD LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; COERCIVE FORCE; CRYSTALLINE MATERIALS; CRYSTALLOGRAPHY; DEPOSITION; ELECTRON ENERGY LOSS SPECTROSCOPY; FERROMAGNETIC MATERIALS; HEAT TRANSFER; HIGH RESOLUTION ELECTRON MICROSCOPY; LAYERED MANUFACTURING; MAGNETORESISTANCE; RANDOM ACCESS STORAGE; SURFACE ROUGHNESS; SWITCHING; TRANSMISSION ELECTRON MICROSCOPY;

AMORPHOUS FERROMAGNETIC LAYERS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY (HRTEM); MAGNETIC TUNNEL JUNCTIONS (MTJ); PRECISION ION POLISHING SYSTEM (PIPS);

TUNNEL JUNCTIONS;

EID: 5044229184     PISSN: 09513248     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

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